Technique enables production of pure, uniform coatings of metals or polymers, even on contoured surfaces. MIT's Karen Gleason has advanced Chemical Vapor Deposition (CVD) techniques, transforming it from a high-temperature to a low-temperature process, enabling the deposition of delicate material
In the process called initiated chemical vapor deposition , Heated wires cause “initiator” molecules to split, and they then interact with the monomers used for coating, causing them to collect on the cooler surface below, where they react to form a polymer chain as they build up in a uniform coating . Credit: Illustration courtesy of Karen Gleason
In that latter area, Gleason, who also serves as MIT’s associate provost, has been a pioneer. She developed what had traditionally been a high-temperature process used to deposit metals under industrial conditions into a low-temperature process that could be used for more delicate materials, such as organic polymers.
— an electrically charged gas — to initiate the reaction. Gleason tried to carry out experiments to prove this, beginning by running a control experiment without the plasma in order to demonstrate how important it was for making the process work. Instead, her control experiment worked just fine with no plasma at all, proving that for many polymers this step was not necessary.
With metals or metal compounds, such as those used in the semiconductor industry, or the silvery coatings inside snack bags, the heated metal vapor deposits on a cooler substrate. In the polymer process, it’s a bit more complex: Two or more different precursor compounds, called monomers, are introduced into the chamber, where they react to form polymers as they deposit on the surface.
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